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Open Access

Correction

Correction: Occurrence of Diverse Antimicrobial Resistance Determinants in Genetically Unrelated Biocide Tolerant Klebsiella pneumoniae

  • Amitabha Mondal,
  • Manjunath Venkataramaiah,
  • Govindan Rajamohan,
  • Vijaya Bharathi Srinivasan

In Fig 6, images B (i) and B (ii) are incorrectly displayed. Please see the corrected Fig 6 here.

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Fig 6. Oxidative stress and bioflim formating assay in K. pneumoniae strains.

(A) Diagram showing the zone of inhibition in different strains due to the different concentration of H2O2. In this study 0%, 0.1%, 1%, 3%, and 10% of H2O2 were used as oxidative stress inducing agent. The diagram represents the mean of three independent experiments. (B) Biofilm formation by the K. pneumoniae isolates are shown here: i) tubes showing stained biofilm rings in few representative isolates ii) graphical presentation of biofilm formation among the isolates is shown as the ratio of OD570nm and OD600nm. The bar graph represents the mean of three independent experiments.

https://doi.org/10.1371/journal.pone.0175487.g001

Reference

  1. 1. Mondal A, Venkataramaiah M, Rajamohan G, Srinivasan VB (2016) Occurrence of Diverse Antimicrobial Resistance Determinants in Genetically Unrelated Biocide Tolerant Klebsiella pneumoniae. PLoS ONE 11(11): e0166730. pmid:27870879

Citation: Mondal A, Venkataramaiah M, Rajamohan G, Srinivasan VB (2017) Correction: Occurrence of Diverse Antimicrobial Resistance Determinants in Genetically Unrelated Biocide Tolerant Klebsiella pneumoniae. PLoS ONE 12(4): e0175487. https://doi.org/10.1371/journal.pone.0175487

Published: April 5, 2017

Copyright: © 2017 Mondal et al. This is an open access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.