Peer Review History
| Original SubmissionApril 13, 2026 |
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-->PONE-D-26-18004-->-->Optimising Cold Spray Additive Manufacturing: Pressure-Driven Enhancement of Mechanical Performance in Copper Deposits-->-->PLOS One Dear Dr. Tran, Thank you for submitting your manuscript to PLOS ONE. After careful consideration, we feel that it has merit but does not fully meet PLOS ONE’s publication criteria as it currently stands. Therefore, we invite you to submit a revised version of the manuscript that addresses the points raised during the review process. ============================== ACADEMIC EDITOR: The manuscript needs the revisions as suggested by the reviewers. ============================== Please submit your revised manuscript by Jun 18 2026 11:59PM. If you will need more time than this to complete your revisions, please reply to this message or contact the journal office at plosone@plos.org. When you're ready to submit your revision, log on to https://www.editorialmanager.com/pone/ and select the 'Submissions Needing Revision' folder to locate your manuscript file. Please include the following items when submitting your revised manuscript:-->
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If this statement is not true and your adherence to PLOS policies on sharing data and materials is altered, please explain how. Please include the updated Competing Interests Statement and Funding Statement in your cover letter. We will change the online submission form on your behalf. 3. Thank you for stating the following in the Competing Interests section: [I have read the journal's policy, and the authors of this manuscript have the following competing interests: Steven Camilleri, Tien Tran, Andrew Duguid, Mathew Harbidge and Riyan Rashid are employees of SPEE3D. This has been declared in the authorship details.]. We note that one or more of the authors are employed by a commercial company: SPEE3D. 1. Please provide an amended Funding Statement declaring this commercial affiliation, as well as a statement regarding the Role of Funders in your study. 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Please note that, though access restrictions are acceptable now, your entire data will need to be made freely accessible if your manuscript is accepted for publication. This policy applies to all data except where public deposition would breach compliance with the protocol approved by your research ethics board. If you are unable to adhere to our open data policy, please kindly revise your statement to explain your reasoning and we will seek the editor's input on an exemption. Please be assured that, once you have provided your new statement, the assessment of your exemption will not hold up the peer review process. 5. Please amend the manuscript submission data (via Edit Submission) to include author Tien Tran. 6. Please amend your authorship list in your manuscript file to include author Thi Thuy Tien Tran. 7. Please ensure that you refer to Figure 3 in your text as, if accepted, production will need this reference to link the reader to the figure. If the reviewer comments include a recommendation to cite specific previously published works, please review and evaluate these publications to determine whether they are relevant and should be cited. There is no requirement to cite these works unless the editor has indicated otherwise. Additional Editor Comments: The manuscript needs the revisions as suggested by the reviewers. [Note: HTML markup is below. Please do not edit.] Reviewers' comments: Reviewer's Responses to Questions -->Comments to the Author 1. Is the manuscript technically sound, and do the data support the conclusions? The manuscript must describe a technically sound piece of scientific research with data that supports the conclusions. Experiments must have been conducted rigorously, with appropriate controls, replication, and sample sizes. The conclusions must be drawn appropriately based on the data presented. --> Reviewer #1: Partly Reviewer #2: Yes ********** -->2. Has the statistical analysis been performed appropriately and rigorously? --> Reviewer #1: N/A Reviewer #2: N/A ********** -->3. Have the authors made all data underlying the findings in their manuscript fully available? The PLOS Data policy requires authors to make all data underlying the findings described in their manuscript fully available without restriction, with rare exception (please refer to the Data Availability Statement in the manuscript PDF file). The data should be provided as part of the manuscript or its supporting information, or deposited to a public repository. For example, in addition to summary statistics, the data points behind means, medians and variance measures should be available. If there are restrictions on publicly sharing data—e.g. participant privacy or use of data from a third party—those must be specified.--> Reviewer #1: Yes Reviewer #2: Yes ********** -->4. Is the manuscript presented in an intelligible fashion and written in standard English? PLOS ONE does not copyedit accepted manuscripts, so the language in submitted articles must be clear, correct, and unambiguous. Any typographical or grammatical errors should be corrected at revision, so please note any specific errors here.--> Reviewer #1: Yes Reviewer #2: Yes ********** -->5. Review Comments to the Author Please use the space provided to explain your answers to the questions above. You may also include additional comments for the author, including concerns about dual publication, research ethics, or publication ethics. (Please upload your review as an attachment if it exceeds 20,000 characters)--> Reviewer #1: - The authors must explicitly clarify how this work advances beyond existing studies—particularly whether the contribution lies in quantitative correlation, LightSPEE3D-specific processing, or integrated mechanical–electrical optimization. - The conclusions strongly rely on particle velocity values and their relation to critical velocity; however, there is no clear description of how velocity was measured or validated - Porosity reduction and bonding improvement lack quantitative validation; no measurements of porosity, inter-splat bonding, or oxide thickness and distribution are provided. - The manuscript does not address residual stress, which is a key factor in interpreting tensile and fracture behavior. - Strength–ductility trade-off is inadequately explained: lacks dislocation density validation, no strengthening models applied, and ultimate tensile strength stabilization remains mechanistically unclear. - The study focuses only on spray pressure, but other important factors like gas temperature, powder size, stand-off distance, and nozzle design are overlooked, limiting broader applicability. - In introduction section these references may be helpful: # Recent Progress in 5D Printing: Processes, Materials, Applications, and Future Trends #Improvement in corrosion resistance of AISI 316L stainless steel weld cladding using GTA remelting technique # Sensitization studies on low cycle fatigue and cryogenic impact behavior of AISI 304 SS weldments Reviewer #2: 1. The manuscript addresses an industrially relevant topic, but the novelty is moderate because the influence of spray pressure on cold-sprayed copper has been previously reported, and the present study should more clearly define its unique mechanistic contribution beyond existing pressure–property studies. 2. The study focuses only on spray pressure, while other strongly coupled deposition parameters (gas temperature, standoff distance, feed rate, nozzle traverse speed) are held constant and insufficiently discussed, limiting the broader applicability of the conclusions. 3. The justification for selecting only four pressure levels (30, 40, 50, and 60 bar) is not adequately explained, and intermediate values could strengthen the identification of the proposed optimum processing window. 4. The manuscript repeatedly attributes improved ductility to continuous dynamic recrystallization (cDRX), but this central claim is inferred indirectly from XRD broadening and SEM rather than being directly validated using EBSD or TEM. 5. The use of Williamson–Hall analysis alone to estimate crystallite size and dislocation density is insufficient for a strong mechanistic claim, especially in heavily deformed copper where instrumental broadening and residual stress can significantly affect peak width. 6. The discussion of dynamic recrystallization is overstated, as no direct grain orientation maps or recrystallized fraction measurements are presented to distinguish recovery, polygonization, and true recrystallization. 7. The hardness and conductivity trends are interesting, but the manuscript does not adequately explain the apparent trade-off between reduced hardness and improved tensile ductility using established strengthening models. 8. The conductivity values are reported close to bulk copper (up to 98.4% IACS), but the manuscript does not sufficiently discuss possible measurement uncertainty, surface effects, or anisotropy in eddy current testing. 9. The claim of “bulk-like plasticity” is somewhat overstated, as the tensile strength remains significantly lower than wrought copper and should be discussed more cautiously. 10. The fracture analysis is qualitatively described, but the SEM fractography would benefit from quantitative dimple size analysis or fracture surface area comparison to support the ductile transition claim. 11. The manuscript lacks porosity quantification, despite porosity being repeatedly invoked as a major reason for conductivity and ductility changes. 12. The role of oxide rupture is central to the bonding mechanism, yet no chemical surface analysis (e.g., XPS or EDS mapping) is provided to directly support oxide disruption or reduction with pressure. 13. Residual stress, which is highly relevant in cold spray deposits and can strongly influence ductility and cracking, is not measured or discussed. 14. The particle velocity measurements are useful, but the manuscript does not sufficiently discuss velocity distribution spread, particle size dependence, or deposition efficiency, all of which are important for interpreting process–structure relationships. 15. The industrial significance is promising, but the manuscript would be stronger if the authors discussed how the identified 50–60 bar processing window translates into cost, energy consumption, and scalability in industrial CSAM. ********** -->6. PLOS authors have the option to publish the peer review history of their article (what does this mean?). If published, this will include your full peer review and any attached files. If you choose “no”, your identity will remain anonymous but your review may still be made public. Do you want your identity to be public for this peer review? For information about this choice, including consent withdrawal, please see our Privacy Policy.--> Reviewer #1: No Reviewer #2: No ********** [NOTE: If reviewer comments were submitted as an attachment file, they will be attached to this email and accessible via the submission site. Please log into your account, locate the manuscript record, and check for the action link "View Attachments". If this link does not appear, there are no attachment files.] To ensure your figures meet our technical requirements, please review our figure guidelines: https://journals.plos.org/plosone/s/figures You may also use PLOS’s free figure tool, NAAS, to help you prepare publication quality figures: https://journals.plos.org/plosone/s/figures#loc-tools-for-figure-preparation. NAAS will assess whether your figures meet our technical requirements by comparing each figure against our figure specifications. |
| Revision 1 |
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Optimising Cold Spray Additive Manufacturing: Pressure-Driven Enhancement of Mechanical Performance in Copper Deposits PONE-D-26-18004R1 Dear Dr. Tran, We’re pleased to inform you that your manuscript has been judged scientifically suitable for publication and will be formally accepted for publication once it meets all outstanding technical requirements. Within one week, you’ll receive an e-mail detailing the required amendments. When these have been addressed, you’ll receive a formal acceptance letter and your manuscript will be scheduled for publication. An invoice will be generated when your article is formally accepted. Please note, if your institution has a publishing partnership with PLOS and your article meets the relevant criteria, all or part of your publication costs will be covered. Please make sure your user information is up-to-date by logging into Editorial Manager at Editorial Manager® and clicking the ‘Update My Information' link at the top of the page. For questions related to billing, please contact billing support. If your institution or institutions have a press office, please notify them about your upcoming paper to help maximize its impact. If they’ll be preparing press materials, please inform our press team as soon as possible -- no later than 48 hours after receiving the formal acceptance. Your manuscript will remain under strict press embargo until 2 pm Eastern Time on the date of publication. For more information, please contact onepress@plos.org. Kind regards, Gaurav Arora, Ph.D Academic Editor PLOS One Additional Editor Comments (optional): An acceptance has been suggested for the article by the respected reviewers. Reviewers' comments: Reviewer's Responses to Questions -->Comments to the Author 1. If the authors have adequately addressed your comments raised in a previous round of review and you feel that this manuscript is now acceptable for publication, you may indicate that here to bypass the “Comments to the Author” section, enter your conflict of interest statement in the “Confidential to Editor” section, and submit your "Accept" recommendation.--> Reviewer #1: All comments have been addressed Reviewer #2: All comments have been addressed ********** -->2. Is the manuscript technically sound, and do the data support the conclusions? The manuscript must describe a technically sound piece of scientific research with data that supports the conclusions. Experiments must have been conducted rigorously, with appropriate controls, replication, and sample sizes. The conclusions must be drawn appropriately based on the data presented. --> Reviewer #1: Yes Reviewer #2: Yes ********** -->3. Has the statistical analysis been performed appropriately and rigorously? --> Reviewer #1: Yes Reviewer #2: N/A ********** -->4. Have the authors made all data underlying the findings in their manuscript fully available? The PLOS Data policy requires authors to make all data underlying the findings described in their manuscript fully available without restriction, with rare exception (please refer to the Data Availability Statement in the manuscript PDF file). The data should be provided as part of the manuscript or its supporting information, or deposited to a public repository. For example, in addition to summary statistics, the data points behind means, medians and variance measures should be available. If there are restrictions on publicly sharing data—e.g. participant privacy or use of data from a third party—those must be specified.--> Reviewer #1: Yes Reviewer #2: Yes ********** -->5. Is the manuscript presented in an intelligible fashion and written in standard English? PLOS ONE does not copyedit accepted manuscripts, so the language in submitted articles must be clear, correct, and unambiguous. Any typographical or grammatical errors should be corrected at revision, so please note any specific errors here.--> Reviewer #1: Yes Reviewer #2: Yes ********** -->6. Review Comments to the Author Please use the space provided to explain your answers to the questions above. You may also include additional comments for the author, including concerns about dual publication, research ethics, or publication ethics. (Please upload your review as an attachment if it exceeds 20,000 characters)--> Reviewer #1: All reviewer comments have been satisfactorily addressed. The revisions have improved the manuscript's clarity, technical quality, and presentation. I recommend acceptance for publication. Reviewer #2: (No Response) ********** -->7. PLOS authors have the option to publish the peer review history of their article (what does this mean?). If published, this will include your full peer review and any attached files. If you choose “no”, your identity will remain anonymous but your review may still be made public. Do you want your identity to be public for this peer review? For information about this choice, including consent withdrawal, please see our Privacy Policy.--> Reviewer #1: No Reviewer #2: No ********** |
| Formally Accepted |
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PONE-D-26-18004R1 PLOS One Dear Dr. Tran, I'm pleased to inform you that your manuscript has been deemed suitable for publication in PLOS One. Congratulations! Your manuscript is now being handed over to our production team. At this stage, our production department will prepare your paper for publication. This includes ensuring the following: * All references, tables, and figures are properly cited * All relevant supporting information is included in the manuscript submission, * There are no issues that prevent the paper from being properly typeset You will receive further instructions from the production team, including instructions on how to review your proof when it is ready. Please keep in mind that we are working through a large volume of accepted articles, so please give us a few days to review your paper and let you know the next and final steps. Lastly, if your institution or institutions have a press office, please let them know about your upcoming paper now to help maximize its impact. If they'll be preparing press materials, please inform our press team within the next 48 hours. Your manuscript will remain under strict press embargo until 2 pm Eastern Time on the date of publication. For more information, please contact onepress@plos.org. You will receive an invoice from PLOS for your publication fee after your manuscript has reached the completed accept phase. If you receive an email requesting payment before acceptance or for any other service, this may be a phishing scheme. Learn how to identify phishing emails and protect your accounts at https://explore.plos.org/phishing. If we can help with anything else, please email us at customercare@plos.org. Thank you for submitting your work to PLOS ONE and supporting open access. Kind regards, PLOS ONE Editorial Office Staff on behalf of Dr. Gaurav Arora Academic Editor PLOS One |
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