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Figure 1.

(a) I–V characteristics of Ni contacts on ZnO thin film before annealing.

(b) I–V characteristics after annealing at 800°C. (c) XRD 2-theta pattern before annealing. (d) XRD 2-theta pattern after annealing at 800°C.

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Figure 1 Expand

Figure 2.

(a) XPS Ni 2p regional scan.

(b) O 1s regional scan. (c) Zn 2p regional scan.

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Figure 2 Expand

Figure 3.

I–V characteristics of the Ni contact on (a) Zn-polar surface before annealing; (b) Zn-polar surface after annealing; (c) O-polar surface before annealing; (d) O-polar surface after annealing.

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Figure 3 Expand

Figure 4.

XRD patterns of the Ni contact on (a) Zn-polar surface before annealing; (b) Zn-polar surface after annealing; (c) O-polar surface before annealing; (d) O-polar surface after annealing.

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Figure 4 Expand