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Highly efficient UV/H2O2 technology for the removal of nifedipine antibiotics: Kinetics, co-existing anions and degradation pathways
- Wenping Dong,
- Chuanxi Yang,
- Lingli Zhang,
- Qiang Su,
- Xiaofeng Zou,
- Wenfeng Xu,
- Xingang Gao,
- Kang Xie,
- Weiliang Wang
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- Published: October 28, 2021
- https://doi.org/10.1371/journal.pone.0258483