High-Resolution, High-Throughput, Positive-Tone Patterning of Poly(ethylene glycol) by Helium Beam Exposure through Stencil Masks

• Eliedonna E. Cacao,

  Affiliation Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas, United States of America

  ⨯
• Azeem Nasrullah,

  Affiliation Department of Electrical and Computer Engineering, University of Houston, Houston, Texas, United States of America

  ⨯
• Tim Sherlock,

  Affiliation Department of Electrical and Computer Engineering, University of Houston, Houston, Texas, United States of America

  ⨯
• Steven Kemper,

  Affiliation Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas, United States of America

  ⨯
• Katerina Kourentzi,

  Affiliation Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas, United States of America

  ⨯
• Paul Ruchhoeft ,

  * E-mail: PRuchhoeft@uh.edu (PR); willson@uh.edu (RCW)

  Affiliations Department of Electrical and Computer Engineering, University of Houston, Houston, Texas, United States of America, Department of Biomedical Engineering, University of Houston, Houston, Texas, United States of America

  ⨯
• Gila E. Stein,

  Affiliation Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas, United States of America

  ⨯
• Richard C. Willson

  * E-mail: PRuchhoeft@uh.edu (PR); willson@uh.edu (RCW)

  Affiliations Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas, United States of America, Department of Biology and Biochemistry, University of Houston, Houston, Texas, United States of America, The Methodist Hospital Research Institute, Houston, Texas, United States of America

  ⨯