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An open source three-mirror laser scanning holographic two-photon lithography system

Fig 1

Optical scheme of the system.

(A) Overall view from the Computer-Aided Design (CAD) model. The inset shows a magnification of the sample holder and the objective lens. (B) Schematic representation of the system. After power control (I), a fs-pulsed laser beam is phase modulated by the SLM (II) and the reconstructed hologram can be translated within the field of view through a virtually conjugated galvo triplet (III). An epi-illumination and imaging system (IV) allow for real time monitor of the lithographic process. Details on all the optical and optomechanical elements are given in S2 File.

Fig 1